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Descripción de Producto
Physical Vapor Deposition PVD Vacuum Chamber
| Machine Photos |
| About Cathodic Arc Evaporation |
In this process, an arc with a diameter ranging from microns to just a few tenths of a micron, is run over the solid, metallic coating material, causing it to evaporate. The high currents and power densities used cause almost complete ionization of the evaporated material and, thereby, the formation of a high-energy plasma.
The metal ions combine with a reactive gas that is introduced into the chamber, strike the target tools or components with high energy and are deposited as a thin and highly adherent coating.
| About the process |
1. Argon
2. Reactive gas
3. Arc Sources (coating material and backing plate)
4. Components/Tools
5. Vacuum pump
PS: All the origin of standard parts can be replaced under the customer's demands.
| Common coatings made by our machine |
| Technical Spcifications |
| Model Number | ARC-600 | ARC-900 | ARC-1000 | ARC-1200 |
| Dimension of vacuum chamber(diameter*height) | 600*700mm | 900*1000 | 1000*1100 | 1000*1200 |
| Material of vacuum chamber | SUS304 or SUS316L with cooling jacket | |||
| Quantity of arc sources | 1-4 sets | 6-9 sets | 8-12 sets | 10-14 sets |
| Pumping system | molecular pump or diffusion pump+mechanical pump | molecular pump or diffusion pump+mechanical pumps, booster pump | ||
| Pumping Time | From atmosphere to 5.0*10-2Pa less than 8 minutes | |||
| Bias Power Supply | 10kW | 15kW | 20kW | 20kW |
| Gas distribution System with Mass Flow Controllers | ≥3 sets | |||
| Vacuum Limit | 5.0*10-4 Pa | |||
| Working temperature | Up tp 550 centigrades | |||
| Working mode | Automatic or Manual mode, by 10.4 inches PLC touches screen | |||
| Total Power | 40-120kW | 40-120kW | 40-120kW | 70-180kW |
| Footprint | 2*2 meters | 2*3 meters | 3*3 meters | 3*3 meters |
| These units you can custom made | 1. Size of vacuum chamber 2. Quantity of arc sources 3. Configurations of pumps 4. Gas distribution system | |||
| Optional instruments | 1. Coatings thickness monitor 2. Leakage detector 3. Magnetron sputtering system 4. Evaporation system | |||
| Customers' references |
| Year | Customer's nationality | General spec. of the PVD machine | Application |
| 2011 | Mexico | 1000X1100mm, 3 gases, Diffusion pump+ +Roots pump+mechanical pumps | PVD hard coatings: TiN, CrN, TiAlN, etc |
| 2016 | Mexico | 1000X1100mm, 3 gases, Diffusion pump+ +Roots pump+mechanical pumps | PVD hard coatings:TiN, CrN, TiAlN, etc |
| 2015 | Tunisia | 700X800mm, 3 gases, Diffusion pump+ +Roots pump+mechanical pumps | PVD hard coatings:TiN, TiCN, TiAlN, etc |
| 2017 | Slovakia | 700X800mm, 3 gases, Turbo molecular pumps+ +Roots pump+mechanical pumps | PVD hard coatings:TiN, TiCN, CrN, TiAlN, etc |
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